Keywords of "Degradation kinetics of ultrathin HfO2 layers on Si(100) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM"

Label

• Keywords of "Degradation kinetics of ultrathin HfO2 layers on Si(100) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM" (literal)
• Parole chiave di "Degradation kinetics of ultrathin HfO2 layers on Si(100) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM" (literal)

Insieme di parole chiave di

• Degradation kinetics of ultrathin HfO2 layers on Si(100) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM (Articolo in rivista) (Prodotto della ricerca)

Ha membro

• SILICON (Parola chiave)
• ADVANCED GATE DIELECTRICS (Parola chiave)
• SPECTROSCOPY (Parola chiave)
• STABILITY (Parola chiave)
• SIO2 (Parola chiave)

Incoming links:

Insieme di parole chiave

• Degradation kinetics of ultrathin HfO2 layers on Si(100) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM (Articolo in rivista) (Prodotto della ricerca)

Membro di

• SPECTROSCOPY (Parola chiave)
• SILICON (Parola chiave)
• STABILITY (Parola chiave)
• SIO2 (Parola chiave)
• ADVANCED GATE DIELECTRICS (Parola chiave)