Parole chiave di "[(Me3Si)(2)N](3)Lu: Molecular structure and use as Lu and Si source for atomic layer deposition of Lu silicate films"

Label

• Parole chiave di "[(Me3Si)(2)N](3)Lu: Molecular structure and use as Lu and Si source for atomic layer deposition of Lu silicate films" (literal)
• Keywords of "[(Me3Si)(2)N](3)Lu: Molecular structure and use as Lu and Si source for atomic layer deposition of Lu silicate films" (literal)

Insieme di parole chiave di

• [(Me3Si)(2)N](3)Lu: Molecular structure and use as Lu and Si source for atomic layer deposition of Lu silicate films (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Ha membro

• GATE DIELECTRICS (Parola chiave)
• LIQUID-INJECTION MOCVD (Parola chiave)
• ALKOXIDE PRECURSOR (Parola chiave)
• GROWTH (Parola chiave)
• OXIDE THIN-FILMS (Parola chiave)

Incoming links:

Insieme di parole chiave

• [(Me3Si)(2)N](3)Lu: Molecular structure and use as Lu and Si source for atomic layer deposition of Lu silicate films (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Membro di

• GROWTH (Parola chiave)
• ALKOXIDE PRECURSOR (Parola chiave)
• OXIDE THIN-FILMS (Parola chiave)
• GATE DIELECTRICS (Parola chiave)
• LIQUID-INJECTION MOCVD (Parola chiave)