Keywords of "Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition"

Label

• Keywords of "Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition" (literal)
• Parole chiave di "Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition" (literal)

Insieme di parole chiave di

• Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition (Articolo in rivista) (Prodotto della ricerca)

Ha membro

• electric properties (Parola chiave)
• XPS characterization (Parola chiave)
• aluminium nitride (Parola chiave)
• RF plasma assisted PLD (Parola chiave)

Incoming links:

Insieme di parole chiave

• Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition (Articolo in rivista) (Prodotto della ricerca)

Membro di

• aluminium nitride (Parola chiave)
• RF plasma assisted PLD (Parola chiave)
• electric properties (Parola chiave)
• XPS characterization (Parola chiave)