Parole chiave di "A soft Plasma Enhanced-Chemical Vapor Deposition process for the tailored synthesis of SiO2 films"
- Label
- Parole chiave di "A soft Plasma Enhanced-Chemical Vapor Deposition process for the tailored synthesis of SiO2 films" (literal)
- Keywords of "A soft Plasma Enhanced-Chemical Vapor Deposition process for the tailored synthesis of SiO2 films" (literal)
- Insieme di parole chiave di
- A soft Plasma Enhanced-Chemical Vapor Deposition process for the tailored synthesis of SiO2 films (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Ha membro
- Silicon dioxide (Parola chiave)
- Thin films (Parola chiave)
- Hardness (Parola chiave)
- Laser reflection interferometry; Fourier transformed infrared spectroscopy (Parola chiave)
- Plasma-enhanced chemical vapor deposition (Parola chiave)
Incoming links:
- Insieme di parole chiave
- A soft Plasma Enhanced-Chemical Vapor Deposition process for the tailored synthesis of SiO2 films (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Membro di
- Thin films (Parola chiave)
- Hardness (Parola chiave)
- Silicon dioxide (Parola chiave)
- Laser reflection interferometry; Fourier transformed infrared spectroscopy (Parola chiave)
- Plasma-enhanced chemical vapor deposition (Parola chiave)
