Keywords of "Dopant redistribution and electrical activation in silicon following ultra-low energy boron implantation and excimer laser annealing."

Label

• Keywords of "Dopant redistribution and electrical activation in silicon following ultra-low energy boron implantation and excimer laser annealing." (literal)
• Parole chiave di "Dopant redistribution and electrical activation in silicon following ultra-low energy boron implantation and excimer laser annealing." (literal)

Insieme di parole chiave di

• Dopant redistribution and electrical activation in silicon following ultra-low energy boron implantation and excimer laser annealing. (Articolo in rivista) (Prodotto della ricerca)

Ha membro

• excimer laser anneal (Parola chiave)
• Laser annealing (Parola chiave)
• ion implantation (Parola chiave)
• Shallow junctions (Parola chiave)
• shallow junctions (Parola chiave)

Incoming links:

Insieme di parole chiave

• Dopant redistribution and electrical activation in silicon following ultra-low energy boron implantation and excimer laser annealing. (Articolo in rivista) (Prodotto della ricerca)

Membro di

• ion implantation (Parola chiave)
• Shallow junctions (Parola chiave)
• shallow junctions (Parola chiave)
• Laser annealing (Parola chiave)
• excimer laser anneal (Parola chiave)